Random Walk Model for the Growth of Monolayer in Dip Pen Nanolithography

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Random Walk Simulation for the Growth of Monolayer in Dip Pen Nanolithography

Dip-pen nanolithography (DPN) has emerged as a general tool for fabricating nanopatterns on a range of substrates, including metallic, insulating and semiconducting substrates. In DPN, an atomic force microscope (AFM) tip functions as a source to continuously create nanodroplets of molecules that then spread to form a self-assembled monolayer (SAM) on a substrate. Molecular transport from the t...

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ژورنال

عنوان ژورنال: Journal of Physics: Conference Series

سال: 2013

ISSN: 1742-6596

DOI: 10.1088/1742-6596/410/1/012156